An Efficient Simulation System for Inclined UV Lithography...

IEEE Transactions on Semiconductor Manufacturing 2011 Vol. 24; Iss. 2

An Efficient Simulation System for Inclined UV Lithography Processes of Thick SU-8 Photoresists

Zaifa Zhou, Qingan Huang, Zhen Zhu, Weihua Li
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Volume:
24
Year:
2011
Language:
english
Pages:
10
DOI:
10.1109/tsm.2011.2105511
File:
PDF, 1.02 MB
english, 2011
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