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Wafer Bevel Protection During Deep Reactive Ion Etching
Charavel, R., Roig, J., Altamirano-Sanchez, E., van Aelst, J., Devriendt, K., van Wichelen, K., Gassot, P., Coppens, P., De Backer, E.Volume:
24
Year:
2011
Language:
english
Pages:
8
DOI:
10.1109/tsm.2011.2106522
File:
PDF, 797 KB
english, 2011