Plasma-enhanced chemical vapor deposited silicon carbide as...

Plasma-enhanced chemical vapor deposited silicon carbide as an implantable dielectric coating

Stuart F. Cogan, David J. Edell, Andrew A. Guzelian, Ying Ping Liu, Robyn Edell
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Volume:
67A
Year:
2003
Language:
english
Pages:
12
DOI:
10.1002/jbm.a.10152
File:
PDF, 519 KB
english, 2003
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