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A self-similar regime of droplet growth with allowance for the Stefan flux and dependence of diffusion coefficient on vapor-gas medium composition
A. E. Kuchma, A. K. ShchekinVolume:
74
Language:
english
Pages:
8
DOI:
10.1134/s1061933x12020056
Date:
April, 2012
File:
PDF, 547 KB
english, 2012