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Design of binary masks for extreme ultraviolet lithography with deep ultraviolet inspection by using a simple method
Sungjin Park, Pazhanisami Peranantham, Hee Young Kang, Chang Kwon HwangboVolume:
60
Language:
english
Pages:
5
DOI:
10.3938/jkps.60.1305
Date:
April, 2012
File:
PDF, 280 KB
english, 2012