Image construction: optimum amplitude and phase masks in...

Applied Optics 1985 Vol. 24; Iss. 10

Image construction: optimum amplitude and phase masks in photolithography

Saleh, Bahaa E. A., Nashold, Karen M.
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Volume:
24
Year:
1985
Language:
english
Journal:
ao/24/10/ao-24-10-1432.pdf
DOI:
10.1364/AO.24.001432
File:
PDF, 712 KB
english, 1985
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