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Reactive ion beam etching of PLZT electrooptic substrates with repeated self-aligned masking
Title, Mark A., Walpita, L. M., Chen, Wei-Xi, Lee, Sing H., Chang, William S. C.Volume:
25
Year:
1986
Language:
english
Journal:
ao/25/9/ao-25-9-1508.pdf
DOI:
10.1364/AO.25.001508
File:
PDF, 547 KB
english, 1986