![](/img/cover-not-exists.png)
Low-pressure chemical vapor deposition silicon-oxynitride films for integrated optics
Gleine, W., Müller, J.Volume:
31
Year:
1992
Language:
english
Journal:
ao/31/12/ao-31-12-2036.pdf
DOI:
10.1364/AO.31.002036
File:
PDF, 609 KB
english, 1992