Efficient storage, computation, and exposure of...

Applied Optics 1993 Vol. 32; Iss. 14

Efficient storage, computation, and exposure of computer-generated holograms by electron-beam lithography

Newman, Daniel M., Hawley, Robert W., Goeckel, Dennis L., Crawford, Richard D., Abraham, Seth, Gallagher, Neal C.
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Volume:
32
Year:
1993
Language:
english
Journal:
ao/32/14/ao-32-14-2555.pdf
DOI:
10.1364/AO.32.002555
File:
PDF, 1.44 MB
english, 1993
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