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Amorphous silicon and amorphous silicon nitride films prepared by a plasma-enhanced chemical vapor deposition process as optical coating materials
Tsai, Rung-Ywan, Kuo, Lee-Chin, Ho, Fang ChuanVolume:
32
Year:
1993
Language:
english
Journal:
ao/32/28/ao-32-28-5561.pdf
DOI:
10.1364/AO.32.005561
File:
PDF, 618 KB
english, 1993