Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography
Attwood, David, Sommargren, Gary, Beguiristain, Raul, Nguyen, Khanh, Bokor, Jeffrey, Ceglio, Natale, Jackson, Keith, Koike, Masato, Underwood, JamesVolume:
32
Year:
1993
Language:
english
Journal:
ao/32/34/ao-32-34-7022.pdf
DOI:
10.1364/AO.32.007022
File:
PDF, 1.27 MB
english, 1993