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Pinch-Plasma Radiation Source for Extreme-Ultraviolet...

Pinch-Plasma Radiation Source for Extreme-Ultraviolet Lithography with a Kilohertz Repetition Frequency

Bergmann, Klaus, Rosier, Oliver, Neff, Willi, Lebert, Rainer
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Volume:
39
Year:
2000
Language:
english
Journal:
ao/39/22/ao-39-22-3833.pdf
DOI:
10.1364/AO.39.003833
File:
PDF, 94 KB
english, 2000
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