Pinch-Plasma Radiation Source for Extreme-Ultraviolet Lithography with a Kilohertz Repetition Frequency
Bergmann, Klaus, Rosier, Oliver, Neff, Willi, Lebert, RainerVolume:
39
Year:
2000
Language:
english
Journal:
ao/39/22/ao-39-22-3833.pdf
DOI:
10.1364/AO.39.003833
File:
PDF, 94 KB
english, 2000