Fourier-synthesis custom-coherence illuminator for extreme...

Applied Optics 2003 Vol. 42; Iss. 5

Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography

Naulleau, Patrick P., Goldberg, Kenneth A., Batson, Phil, Bokor, Jeffrey, Denham, Paul, Rekawa, Senajith
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Volume:
42
Year:
2003
Language:
english
Journal:
ao/42/5/ao-42-5-820.pdf
DOI:
10.1364/AO.42.000820
File:
PDF, 3.73 MB
english, 2003
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