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Repairing Amplitude Defects in Multilayer-Coated Extreme-Ultraviolet Lithography Reticles by Use of a Focused Ion Beam
Barty, Anton, Hau-Riege, Stefan, Stearns, Dan, Clift, Miles, Mirkarimi, Paul, Gullikson, Eric, Chapman, Henry, Sweeney, DonVolume:
43
Year:
2004
Language:
english
Journal:
ao/43/36/ao-43-36-6545.pdf
DOI:
10.1364/AO.43.006545
File:
PDF, 899 KB
english, 2004