Adjustable refractive index modulation for a waveguide with...

Applied Optics 2006 Vol. 45; Iss. 31

Adjustable refractive index modulation for a waveguide with SU-8 photoresist by dual-UV exposure lithography

Ong, Biow Hiem, Yuan, Xiaocong, Tjin, Swee Chuan
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Volume:
45
Year:
2006
Language:
english
Journal:
ao/45/31/ao-45-31-8036.pdf
DOI:
10.1364/AO.45.008036
File:
PDF, 660 KB
english, 2006
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