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Applying an interferometric exposure model to analyze the influences of process parameters on the linewidth
Chien, Cheng-Wei, Chen, Jyh-Chen, Lee, Ju-YiVolume:
45
Year:
2006
Language:
english
Journal:
ao/45/32/ao-45-32-8278.pdf
DOI:
10.1364/AO.45.008278
File:
PDF, 3.18 MB
english, 2006