Atomic layer deposition of Al_2O_3 and TiO_2 multilayers...

Applied Optics 2009 Vol. 48; Iss. 9

Atomic layer deposition of Al_2O_3 and TiO_2 multilayers for applications as bandpass filters and antireflection coatings

Szeghalmi, Adriana, Helgert, Michael, Brunner, Robert, Heyroth, Frank, Gösele, Ulrich, Knez, Mato
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Volume:
48
Year:
2009
Language:
english
Journal:
ao/48/9/ao-48-9-1727.pdf
DOI:
10.1364/AO.48.001727
File:
PDF, 565 KB
english, 2009
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