Modeling the field diffracted from photo mask at oblique...

Applied Optics 2010 Vol. 49; Iss. 22

Modeling the field diffracted from photo mask at oblique incidence

Tawfik Elazhary, Tamer, Hisham Morshed, Ahmed, Khalil, Diaa
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Volume:
49
Year:
2010
Language:
english
Journal:
ao/49/22/ao-49-22-4207.pdf
DOI:
10.1364/AO.49.004207
File:
PDF, 1.09 MB
english, 2010
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