In situ thickness determination of multilayered structures using single wavelength ellipsometry and reverse engineering
Rademacher, Daniel, Vergöhl, Michael, Richter, UweVolume:
50
Year:
2011
Language:
english
Pages:
1
Journal:
ao/50/9/ao-50-9-C222.pdf
DOI:
10.1364/AO.50.00C222
File:
PDF, 944 KB
english, 2011