Water-Related Matrix Isolation Phenomena During NO2...

Applied Spectroscopy 2004 Vol. 58; Iss. 5

Water-Related Matrix Isolation Phenomena During NO2 Photolysis in Argon Matrix

Cocke, David L., Gomes, Jewel A.G., Gossage, John L., Li, Kuyen, Lin, Che-Jen, Tandel, Satish
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Volume:
58
Year:
2004
Language:
english
Pages:
7
Journal:
as/58/5/as-58-5-528.pdf
DOI:
10.1366/000370204774103345
File:
PDF, 234 KB
english, 2004
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