Study of a Chemically Amplified Resist for X-ray...

Applied Spectroscopy 2004 Vol. 58; Iss. 11

Study of a Chemically Amplified Resist for X-ray Lithography by Fourier Transform Infrared Spectroscopy

Patran, A., Tan, T.L., Wong, D., Lee, P., Rawat, R.S.
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Volume:
58
Year:
2004
Language:
english
Pages:
7
Journal:
as/58/11/as-58-11-1288.pdf
DOI:
10.1366/0003702042475402
File:
PDF, 148 KB
english, 2004
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