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Fabrication of nc-Si/SiO2 structure by thermal oxidation...

Fabrication of nc-Si/SiO2 structure by thermal oxidation method and its luminescence characteristics

Haojie Zhang, 张豪杰, Longzhi Lin, 林龙智, Shaoji Jiang, 江绍基
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Volume:
7
Year:
2009
Language:
english
Pages:
3
Journal:
col/7/4/col-7-4-332.pdf
DOI:
10.3788/COL20090704.0332
File:
PDF, 534 KB
english, 2009
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