Binary mask optimization for forward lithography based on the boundary layer model in coherent systems
Ma, Xu, Arce, Gonzalo R.Volume:
26
Year:
2009
Language:
english
Journal:
josaa/26/7/josaa-26-7-1687.pdf
DOI:
10.1364/JOSAA.26.001687
File:
PDF, 277 KB
english, 2009