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65 nm feature sizes using visible wavelength 3-D multiphoton lithography
Haske, Wojciech, Chen, Vincent W., Hales, Joel M., Dong, Wenting, Barlow, Stephen, Marder, Seth R., Perry, Joseph W.Volume:
15
Year:
2007
Language:
english
Journal:
oe/15/6/oe-15-6-3426.pdf
DOI:
10.1364/OE.15.003426
File:
PDF, 4.42 MB
english, 2007