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Inverse design for phase mask lithography: erratum
Rinne, James W., Gupta, Sidhartha, Wiltzius, PierreVolume:
16
Year:
2008
Language:
english
Journal:
oe/16/11/oe-16-11-7804.pdf
DOI:
10.1364/OE.16.007804
File:
PDF, 104 KB
english, 2008