4X reduction extreme ultraviolet interferometric...

Optics Express 2008 Vol. 16; Iss. 12

4X reduction extreme ultraviolet interferometric lithography

Isoyan, Artak, Wüest, A., Wallace, John, Jiang, Fan, Cerrina, Franco
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Volume:
16
Year:
2008
Language:
english
Journal:
oe/16/12/oe-16-12-9106.pdf
DOI:
10.1364/OE.16.009106
File:
PDF, 730 KB
english, 2008
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