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Quantitative determination of the charge carrier concentration of ion implanted silicon by IR-near-field spectroscopy
Jacob, Rainer, Winnerl, Stephan, Schneider, Harald, Helm, Manfred, Wenzel, Marc Tobias, von Ribbeck, Hans-Georg, Eng, Lukas M., Kehr, Susanne C.Volume:
18
Year:
2010
Language:
english
Journal:
oe/18/25/oe-18-25-26206.pdf
DOI:
10.1364/OE.18.026206
File:
PDF, 967 KB
english, 2010