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Tunable ultra-deep subwavelength photolithography using a surface plasmon resonant cavity
Ge, Weihao, Wang, Chinhua, Xue, Yinfei, Cao, Bing, Zhang, Baoshun, Xu, KeVolume:
19
Year:
2011
Language:
english
Journal:
oe/19/7/oe-19-7-6714.pdf
DOI:
10.1364/OE.19.006714
File:
PDF, 1.19 MB
english, 2011