Photothermally enabled lithography for refractive-index...

Optics Letters 2006 Vol. 31; Iss. 10

Photothermally enabled lithography for refractive-index modulation in SU-8 photoresist

Ong, Biow Hiem, Yuan, Xiaocong, Tao, Shaohua, Tjin, Swee Chuan
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
31
Year:
2006
Language:
english
Journal:
ol/31/10/ol-31-10-1367.pdf
DOI:
10.1364/OL.31.001367
File:
PDF, 247 KB
english, 2006
Conversion to is in progress
Conversion to is failed