Realizing Lateral Wrap-Gated Nanowire FETs: Controlling Gate Length with Chemistry Rather than Lithography
Storm, Kristian, Nylund, Gustav, Samuelson, Lars, Micolich, Adam P.Volume:
12
Year:
2012
Language:
english
Pages:
6
DOI:
10.1021/nl104403g
File:
PDF, 3.86 MB
english, 2012