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Effect of Ar+O2 Plasma Etching on Microwave Characteristics of YBa2Cu3O7-x Based Resonators
Ban, Masahito, Takenaka, Tsuyoshi, Hayashi, Kunihiko, Suzuki, Katsumi, Enomoto, YouichiVolume:
35
Year:
1996
Pages:
4
DOI:
10.1143/jjap.35.4318
File:
PDF, 587 KB
1996