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Quantum Chemical Investigation for Chemical Dry Etching of SiO$_{2}$ by Flowing NF$_{3}$ into H$_{2}$ Downflow Plasma
Hayashi, Toshio, Ishikawa, Kenji, Sekine, Makoto, Hori, Masaru, Kono, Akihiro, Suu, KoukouVolume:
51
Year:
2012
Language:
english
DOI:
10.1143/jjap.51.016201
File:
PDF, 624 KB
english, 2012