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AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2101: 18th International Conference on Ion Implantation Technology IIT 2010 - Kyoto, (Japan) (6–11 June 2010)] - Energy effects on the sputtering yield of Si bombarded with gas cluster ion beams
Ichiki, K., Ninomiya, S., Seki, T., Aoki, T., Matsuo, J., Matsuo, Jiro, Kase, Masataka, Aoki, Takaaki, Seki, ToshioYear:
2011
Language:
english
Pages:
4
DOI:
10.1063/1.3548384
File:
PDF, 697 KB
english, 2011