Wafer thermal desorption spectrometry in a rapid thermal...

IEEE Transactions on Semiconductor Manufacturing 2000 Vol. 13; Iss. 3

Wafer thermal desorption spectrometry in a rapid thermal processor using atmospheric pressure ionization mass spectrometry

Vereecke, G., Kondoh, E., Richardson, P., Maex, K., Heyns, M.M.
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Volume:
13
Year:
2000
Language:
english
Pages:
322
DOI:
10.1109/66.857942
File:
PDF, 120 KB
english, 2000
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