Kinetics of Low-Pressure Chemical Vapor Deposition of...

Kinetics of Low-Pressure Chemical Vapor Deposition of TiO[sub 2] from Titanium Tetraisopropoxide

Siefering, K. L.
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Volume:
137
Year:
1990
Language:
english
DOI:
10.1149/1.2086561
File:
PDF, 665 KB
english, 1990
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