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Chemical mechanisms inducing a dc current measured in the flowing post-discharge of an RF He–O 2 plasma torch
Dufour, T, Hubert, J, Vandencasteele, N, Reniers, FVolume:
21
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/21/4/045013
Date:
August, 2012
File:
PDF, 1.72 MB
english, 2012