SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Electron-beam induced photoresist shrinkage influence on 2D profiles
Bunday, Benjamin, Cordes, Aaron, Allgair, John, Aguilar, Daniel Bellido, Tileli, Vasiliki, Thiel, Bradley, Avitan, Yohanan, Peltinov, Ram, Bar-Zvi, Mayaan, Adan, Ofer, Chirko, Konstantin, Raymond, ChrVolume:
7638
Year:
2010
Language:
english
Pages:
1
DOI:
10.1117/12.846991
File:
PDF, 859 KB
english, 2010