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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Coulomb blur advantage of a multi-shaped beam lithography approach
Slodowski, Matthias, Doering, Hans-Joachim, Elster, Thomas, Stolberg, Ines A., Schellenberg, Frank M., La Fontaine, Bruno M.Volume:
7271
Year:
2009
Language:
english
Pages:
1
DOI:
10.1117/12.814113
File:
PDF, 1.16 MB
english, 2009