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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Effective light source optimization with the modified beam for depth-of-focus enhancements
Ogawa, Tohru, Uematsu, Masaya, Ishimaru, Toshiyuki, Kimura, Mitsumori, Tsumori, Toshiro, Brunner, Timothy A.Volume:
2197
Year:
1994
Language:
english
Pages:
12
DOI:
10.1117/12.175425
File:
PDF, 673 KB
english, 1994