Wafer-scale patterning of sub-40 nm diameter and high aspect ratio (>50:1) silicon pillar arrays by nanoimprint and etching
Morton, Keith J, Nieberg, Gregory, Bai, Shufeng, Chou, Stephen YVolume:
19
Year:
2008
Language:
english
DOI:
10.1088/0957-4484/19/34/345301
File:
PDF, 1.16 MB
english, 2008