Stress-induced phenomena in nanosized copper interconnect...

Journal of Applied Physics 2009 Vol. 106; Iss. 9

Stress-induced phenomena in nanosized copper interconnect structures studied by x-ray and electron microscopy

Zschech, Ehrenfried, Huebner, Rene, Chumakov, Dmytro, Aubel, Oliver, Friedrich, Daniel, Guttmann, Peter, Heim, Stefan, Schneider, Gerd
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
106
Year:
2009
Language:
english
DOI:
10.1063/1.3254166
File:
PDF, 678 KB
english, 2009
Conversion to is in progress
Conversion to is failed