Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists
Matthias E. Bahlke, Hiroshi A. Mendoza, Daniel T. Ashall, Allen S. Yin, Marc A. BaldoVolume:
aop
Year:
2012
Language:
english
Pages:
1
DOI:
10.1002/adma.201202446
File:
PDF, 752 KB
english, 2012