Automation of a Mass Flow Controller for Application in...

Contributions to Plasma Physics 2012 Vol. aop; Iss. aop

Automation of a Mass Flow Controller for Application in Time-Multiplex SF6+CH4 Plasma Etching of Silicon

L.L. Tezani, R.S. Pessoa, R.S. Moraes, H.S. Medeiros, C.A. Martins, H.S. Maciel, G. Petraconi Filho, M. Massi, A. S. da Silva Sobrinho
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Volume:
aop
Year:
2012
Language:
english
Pages:
1
DOI:
10.1002/ctpp.201200067
File:
PDF, 490 KB
english, 2012
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