P-11: A New Five-Mask-Count Process for Fabrication of Poly-Si Nanowire-Channel CMOS Inverters
Chia-Hao Kuo, Horng-Chih Lin, Tiao-Yuan HuangVolume:
43
Year:
2012
Language:
english
Pages:
1
DOI:
10.1002/j.2168-0159.2012.tb05980.x
File:
PDF, 473 KB
english, 2012