P-11: A New Five-Mask-Count Process for Fabrication of...

P-11: A New Five-Mask-Count Process for Fabrication of Poly-Si Nanowire-Channel CMOS Inverters

Chia-Hao Kuo, Horng-Chih Lin, Tiao-Yuan Huang
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Volume:
43
Year:
2012
Language:
english
Pages:
1
DOI:
10.1002/j.2168-0159.2012.tb05980.x
File:
PDF, 473 KB
english, 2012
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