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In situ A.C. impedance studies of oxide film growth on Zircaloy-4 in high temperature/high pressure steam
L. Durand-Keklikian, G. Cragnolino, D.D. MacDonaldVolume:
32
Year:
1991
Language:
english
Pages:
366
DOI:
10.1016/0010-938x(91)90080-9
File:
PDF, 232 KB
english, 1991