Impurity diffusion barrier for a-Si:H/SnO2 system

Journal of Non-Crystalline Solids 1989 Vol. 115; Iss. 1-3

Impurity diffusion barrier for a-Si:H/SnO2 system

Yoshiyuki Shiratsuki, Keishi Kawabata, Motomu Sagawa, Seiichi Miyazaki, Masataka Hirose
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Volume:
115
Year:
1989
Language:
english
Pages:
84
DOI:
10.1016/0022-3093(89)90367-0
File:
PDF, 179 KB
english, 1989
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