Amorphous SiOx:H alloy films as wide optical-gap materials

Amorphous SiOx:H alloy films as wide optical-gap materials

K. Haga, H. Miura, M. Kumano, H. Watanabe
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Volume:
115
Year:
1989
Language:
english
Pages:
129
DOI:
10.1016/0022-3093(89)90382-7
File:
PDF, 141 KB
english, 1989
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