Low voltage operation a-Si:H thin film transistors with...

Journal of Non-Crystalline Solids 1989 Vol. 115; Iss. 1-3

Low voltage operation a-Si:H thin film transistors with very thin PECVD a-SiO2 gate dielectric

Guglielmo Fortunato, Luigi Mariucci, Carlo Reita, Piero Foglietti
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Volume:
115
Year:
1989
Language:
english
Pages:
147
DOI:
10.1016/0022-3093(89)90387-6
File:
PDF, 174 KB
english, 1989
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