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Temperature dependence of H radical etching in the deposition of microcrystalline silicon alloy thin films by HG-sensitized photo-CVD
Neeraj Saxena, David E. Albright, Charles M. Fortmann, T.W. Fraser Russell, Philippe M. Fauchet, Ian H. CampbellVolume:
114
Year:
1989
Language:
english
Pages:
804
DOI:
10.1016/0022-3093(89)90725-4
File:
PDF, 189 KB
english, 1989