Formation of photosensitive materials by ion implantation of oxygen ions in silica
R.H Magruder III, D.O Henderson, C.W White, R.A ZuhrVolume:
159
Year:
1993
Language:
english
Pages:
274
DOI:
10.1016/0022-3093(93)90233-n
File:
PDF, 377 KB
english, 1993